Bonded assembly of semiconductor dies containing pad level across-die metal wiring and method of forming the same

Abstract

Through-substrate via structures are formed in a semiconductor substrate of a first semiconductor die. Semiconductor devices, dielectric material layers, and metal interconnect structures are formed over a front surface of the semiconductor substrate. A backside dielectric layer is formed on a backside surface. Integrated line and pad structures are formed over the backside dielectric layer on a respective through-substrate via structure. Each of the integrated line and pad structures includes a respective pad portion and respective line portion that extends from a center region of the backside surface to toward a periphery of the backside surface. A bonded assembly including the first semiconductor die and a second semiconductor die can be formed. Bonding pads can be provided in a center region of the interface between the semiconductor dies to facilitate power and signal distribution in the second semiconductor die with less electrical wiring.