The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2022

Filed:

Nov. 30, 2018
Applicant:

Excillum Ab, Kista, SE;

Inventors:

Björn Hansson, Kista, SE;

Per Takman, Kista, SE;

Yuli Wang, Kista, SE;

Shiho Tanaka, Kista, SE;

Assignee:

EXCILLUM AB, Kista, SE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/14 (2006.01); H01J 35/08 (2006.01);
U.S. Cl.
CPC ...
H01J 35/14 (2013.01); H01J 35/08 (2013.01); H01J 35/153 (2019.05); H01J 2235/082 (2013.01);
Abstract

The present inventive concept relates to an X-ray source comprising: a liquid target source configured to provide a liquid target moving along a flow axis; an electron source configured to provide an electron beam; and a liquid target shaper configured to shape the liquid target to comprise a non-circular cross section with respect to the flow axis, wherein the non-circular cross section has a first width along a first axis and a second width along a second axis, wherein the first width is shorter than the second width, and wherein the liquid target comprises an impact portion being intersected by the first axis; wherein the x-ray source is configured to direct the electron beam towards the impact portion such that the electron beam interacts with the liquid target within the impact portion to generate X-ray radiation.


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