The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2022

Filed:

May. 24, 2017
Applicant:

Dai Nippon Printing Co., Ltd., Tokyo-to, JP;

Inventors:

Takaharu Nagai, Tokyo-to, JP;

Katsutoshi Suzuki, Tokyo-to, JP;

Koji Ichimura, Tokyo-to, JP;

Kouji Yoshida, Tokyo-to, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 33/42 (2006.01); B29C 33/38 (2006.01); B29C 59/00 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/38 (2013.01); B29C 33/3842 (2013.01); B29C 33/42 (2013.01); B29C 59/002 (2013.01); H01L 21/0271 (2013.01);
Abstract

A template and a template blank are used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate, in which a first step structure is formed on a main surface of a base, a second step structure is formed on the first step structure, and an outside region of the second step structure on an upper surface of the first step structure is covered with a light shielding film to solve the above problem.


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