The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2022

Filed:

Jul. 31, 2020
Applicant:

Nalux Co., Ltd., Osaka, JP;

Inventors:

Masato Okano, Osaka, JP;

Daisuke Seki, Osaka, JP;

Kazuya Yamamoto, Osaka, JP;

Makio Nishimaki, Osaka, JP;

Assignee:

NALUX CO., LTD., Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/02 (2006.01);
U.S. Cl.
CPC ...
G02B 5/0215 (2013.01); G02B 5/0252 (2013.01); G02B 5/0268 (2013.01);
Abstract

A diffusion element is configured by combining: a structure for diffusion constituted by combining periodic surface structures having multiple periods to achieve a light intensity distribution in which the light intensity is uniform at angles less than or equal to a predetermined diffusion angle θ and the light intensity is as close as possible to zero intensity at angles greater than the diffusion angle θ; and a diffractive structure having a period of 1 or more and 2 or less times of Λmax, where Λmax is the maximum period of the structure for diffusion.


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