The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2022

Filed:

Nov. 01, 2019
Applicant:

Agm Container Controls, Inc., Tucson, AZ (US);

Inventors:

Andrew Tudhope, Tucson, AZ (US);

Thomas B. Casserly, Tucson, AZ (US);

Salvatore Gennaro, Tucson, AZ (US);

Assignee:

AGM CONTAINER CONTROLS, INC., Tucson, AZ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 8/26 (2006.01); C23C 8/02 (2006.01); C23C 8/80 (2006.01); H05B 7/18 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 8/26 (2013.01); C23C 8/02 (2013.01); C23C 8/80 (2013.01); H01J 37/32027 (2013.01); H01J 37/32394 (2013.01); H01J 37/32899 (2013.01); H05B 7/18 (2013.01);
Abstract

Rapid plasma nitriding is achieved by harnessing the power and increased density of plasma discharges created by hollow cathodes. When opposing surfaces are maintained at the proper voltage, sub atmospheric pressure, and spacing, a phenomenon known as the hollow cathode effect creates additional hot oscillating electrons capable of multiple ionization events thereby increasing the number of ions and electrons per unit volume (plasma density). The present invention describes the harnessing of this phenomenon to rapidly plasma nitride metal surfaces and optionally rapidly deposit functional coatings in a continuous operation for duplex coatings.


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