The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2022

Filed:

Mar. 13, 2017
Applicants:

Agc Glass Europe, Louvain-la-Neuve, BE;

Agc Glass Company North America, Alpharetta, GA (US);

Agc Inc., Chiyoda Ku, JP;

Quertech Ingenierie, Caen, FR;

Inventors:

Benjamine Navet, Louvain-la-Neuve, BE;

Pierre Boulanger, Couthuin, BE;

Denis Busardo, Gonneville sur Mer, FR;

Assignees:

AGC GLASS EUROPE, Louvain-la-Neuve, BE;

AGC GLASS COMPANY NORTH AMERICA, Alpharetta, GA (US);

AGC Inc., Chiyoda Ku, JP;

QUERTECH INGENIERIE, Caen, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 23/00 (2006.01); C03C 3/097 (2006.01); C03C 3/087 (2006.01); B32B 17/10 (2006.01); B60J 1/00 (2006.01); C03C 3/062 (2006.01); C03C 3/064 (2006.01); C03C 3/078 (2006.01); C03C 3/083 (2006.01); C03C 3/085 (2006.01); C03C 3/089 (2006.01); C03C 3/091 (2006.01); C03C 4/02 (2006.01); C03C 4/18 (2006.01); C23C 14/58 (2006.01); C23C 14/48 (2006.01);
U.S. Cl.
CPC ...
C03C 23/0055 (2013.01); B32B 17/10036 (2013.01); B32B 17/10128 (2013.01); B60J 1/001 (2013.01); C03C 3/062 (2013.01); C03C 3/064 (2013.01); C03C 3/078 (2013.01); C03C 3/083 (2013.01); C03C 3/085 (2013.01); C03C 3/087 (2013.01); C03C 3/089 (2013.01); C03C 3/091 (2013.01); C03C 3/097 (2013.01); C03C 4/02 (2013.01); C03C 4/18 (2013.01); C23C 14/48 (2013.01); C23C 14/5833 (2013.01); B32B 2307/4026 (2013.01); B32B 2310/0881 (2013.01); B32B 2315/08 (2013.01); B32B 2605/006 (2013.01); B32B 2605/08 (2013.01);
Abstract

A method for manufacturing neutral color antireflective glass substrates by ion implantation, the method including ionizing a Nsource gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 20 kV and 25 kV and setting the ion dosage at a value between 6×10ions/cmand −5.00×10×A/kV+2.00×10ions/cm. A neutral color antireflective glass substrates including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.


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