The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2022

Filed:

May. 19, 2021
Applicant:

Lex Diagnostics Ltd., Royston, GB;

Inventors:

Justin Buckland, Royston, GB;

Tom Jellicoe, Royston, GB;

Alex Stokoe, Royston, GB;

Amaru Araya-Williams, Royston, GB;

Assignee:

Lex Diagnostics Ltd., Hertfordshire, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01L 7/00 (2006.01); B01L 3/00 (2006.01); C12Q 1/6806 (2018.01); C12Q 1/686 (2018.01);
U.S. Cl.
CPC ...
B01L 7/52 (2013.01); B01L 3/5027 (2013.01); C12Q 1/6806 (2013.01); C12Q 1/686 (2013.01); B01L 2300/0883 (2013.01); B01L 2300/1827 (2013.01); B01L 2300/1883 (2013.01);
Abstract

There is described a variable-temperature reactor for hosting a predetermined reaction therein. The reactor comprises a reaction cell, a heater, and a heat sink. The reaction cell has a reaction volume with thickness Hand width Wwhere W>4Hand is defined by faces with one of the larger area faces of the reaction volume being bounded by an outer wall with thickness H. The heater is in contact with the said outer wall. The heater comprises a heat-generating heater element located on the face closer to the reaction volume and a heater support on the opposite face. The heater support is in contact with a heat sink, such that the heater support provides a thermal resistance Rbetween the heater element and the heat sink. The reactor, when filled with reagents having thermal diffusion coefficient Dhas a diffusion time t, in the thickness direction, t=H/D. tis less than the reaction time constant t. The outer wall has a thermal diffusion coefficient Dand has a thermal diffusion time t=H|D<t.


Find Patent Forward Citations

Loading…