The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2022
Filed:
Jul. 06, 2020
Canon Kabushiki Kaisha, Tokyo, JP;
Junichi Nakagawa, Tokyo, JP;
Hirokazu Tanaka, Inagi, JP;
Tsukasa Doi, Tokyo, JP;
Mayuko Yamagata, Inagi, JP;
Satoshi Seki, Kawasaki, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
Formed is a dither pattern that makes it possible to output an image with excellent dot dispersibility and reduced graininess regardless of controls after quantization processing. To this end, an extended pattern in which multiple divided pixels correspond to each of multiple pixels included in quantization data and one or more of the multiple divided pixels are determined as dot-arrangeable-pixels in which dots can be printed is generated. Thereafter, the thresholds of the dither pattern are set based on the extended pattern in which the dots are arranged to obtain predetermined dispersibility.