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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11333978 B1

PDFFull Text
Date of Patent:
May. 17, 2022

Filed:

Dec. 30, 2019

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing solid-state imaging element

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Kohei Higashi, Shizuoka, JP;

Hideki Takakuwa, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Calvin Y Choi

Int. Cl.
CPC ...
H01L 21/00 (2006.01); G03F 7/038 (2006.01); G02B 5/20 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); H01L 27/146 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); G02B 5/208 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); H01L 27/1462 (2013.01); H01L 27/14685 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract

An actinic ray-sensitive or radiation-sensitive resin composition for forming a pattern used as a mask in an ion implanting, including a resin including a repeating unit having an acid-decomposable group, a photoacid generator, and an additive having a melting point or glass transition temperature of lower than 25° C. and a molecular weight of 180 or more, in which a content of the additive is 1% by mass or more with respect to a total solid content in the composition.

Find Patent Forward Citations

Higashi, Kohei. (2022). Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing solid-state imaging element (U.S. Patent No. 11333978). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11333978

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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