The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2022
Filed:
Apr. 10, 2019
Silicon Light Machines Corporation, Sunnyvale, CA (US);
Yoshimi Hashimoto, Kyoto, JP;
SILICON LIGHT MACHINES CORPORATION, San Jose, CA (US);
Abstract
A system including two dimensional, microelectromechanical system (MEMS) based spatial light modulators and anamorphic optics for improved contrast is provided. Generally, the system comprises an array of modulators having a plurality of pixels along a longitudinal axis, each pixel comprising a plurality of modulators along a transverse axis of the array. An illumination source including a laser and anamorphic optics for focuses light from the laser onto the array, and imaging optics focus modulated light from the array onto an image plane. The anamorphic optics are configured to provide a transverse numerical aperture (NA) along the transverse axis of the array that is smaller than a diffraction angle of the modulated light reflected from the array along a transverse axis of the image plane, and a longitudinal NA along the longitudinal axis of the array that is greater than the transverse NA. Other embodiments are also provided.