The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2022

Filed:

Dec. 14, 2016
Applicant:

Sekisui Chemical Co., Ltd., Osaka, JP;

Inventors:

Seigo Ono, Tsukuba, JP;

Toshimasa Takeuchi, Tsukuba, JP;

Setsuo Nakajima, Tokyo, JP;

Koichiro Iwasa, Tokyo, JP;

Makoto Fujigami, Fujisawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A01H 1/04 (2006.01); A01G 31/00 (2018.01); A01G 31/02 (2006.01); A01N 59/08 (2006.01); C12N 1/20 (2006.01); A01N 63/25 (2020.01);
U.S. Cl.
CPC ...
A01G 31/00 (2013.01); A01G 31/02 (2013.01); A01N 59/08 (2013.01); A01N 63/25 (2020.01); C12N 1/20 (2013.01);
Abstract

The present invention provides a plant cultivation method, which enables plant cultivation under high salinity environment for a long time. A method for hydroponic plant cultivation under high salinity environment, comprising a cultivation step of hydroponically growing a plant with a cultivation solution having a sodium chloride concentration of 1% by mass or more, during which a salt resistance imparting treatment is performed at least once by bringing a salt tolerance imparting agent into contact with at least a part of a root of the plant, thereby maintaining salt tolerance of the plant.


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