The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2022

Filed:

Dec. 19, 2017
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Robert George Manley, Vestal, NY (US);

Karan Mehrotra, Painted Post, NY (US);

Barry James Paddock, Horseheads, NY (US);

Rajesh Vaddi, Corning, NY (US);

Nikolay Zhelev Zhelev, Painted Post, NY (US);

Bin Zhu, Ithaca, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); G03F 7/20 (2006.01); H01L 51/05 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0018 (2013.01); G03F 7/70 (2013.01); H01L 51/004 (2013.01); H01L 51/0023 (2013.01); H01L 51/0043 (2013.01); H01L 51/0558 (2013.01); G03F 7/40 (2013.01);
Abstract

A method of fabricating microstructures of polar elastomers includes coating a substrate with a dielectric material including a polar elastomer, coating the dielectric material with a photoresist, exposing the photoresist to ultraviolet (UV) light through a photomask to define a pattern on the photoresist, developing the photoresist to form the pattern on the photoresist, etching the dielectric material to transfer the pattern from the photoresist to the dielectric material, and removing the photoresist from the patterned dielectric material.


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