The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2022

Filed:

Oct. 01, 2020
Applicants:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Seoul National University R&db Foundation, Seoul, KR;

Inventors:

Minhyun Lee, Suwon-si, KR;

Seongjun Park, Seoul, KR;

Hyunjae Song, Hwaseong-si, KR;

Hyeonjin Shin, Suwon-si, KR;

Kibum Kim, Seoul, KR;

Sanghun Lee, Seoul, KR;

Yunho Kang, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 45/00 (2006.01); H01L 21/768 (2006.01); G11C 13/00 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1253 (2013.01); G11C 13/0004 (2013.01); H01L 21/76846 (2013.01); H01L 45/06 (2013.01); H01L 45/145 (2013.01); H01L 45/1616 (2013.01); G11C 13/0007 (2013.01); G11C 13/0069 (2013.01); G11C 2013/009 (2013.01); G11C 2213/51 (2013.01);
Abstract

A nonvolatile memory apparatus includes a first electrode, a second electrode separated from the first electrode, a resistive-change material layer provided between the first electrode and the second electrode and configured to store information due to a resistance change caused by an electrical signal applied through the first electrode and the second electrode, and a diffusion prevention layer provided between the first electrode and the resistive-change material layer and/or between the second electrode and the resistive-change material layer and including a two-dimensional (2D) material having a monolayer thickness of about 0.35 nm or less.


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