Multi-negative differential transconductance device and method of producing the same

Abstract

A multi-negative differential transconductance device includes a substrate conductive portion; a gate insulating layer formed by being laminated on the substrate conductive portion; a first semiconductor, a second semiconductor, and a third semiconductor which have different threshold voltages and are formed to be horizontally connected in series on the gate insulating layer; and an electrode formed at both ends of the first semiconductor and the third semiconductor. The multi-negative differential transconductance device forms a junction of three or more semiconductor materials in one device to have a plurality of peaks and valleys so that the multi-negative differential transconductance device is utilized to implement a multi-valued logic circuit which is capable of representing four or more logical states without significantly increasing an area of the negative differential transconductance device which occupies the chip. Therefore, effects of low power consumption, a reduced size, and high speed of a chip may be achieved.