The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2022

Filed:

Jan. 26, 2021
Applicants:

Kawasaki Jukogyo Kabushiki Kaisha, Kobe, JP;

Kawasaki Robotics (Usa), Inc., Wixom, MI (US);

Inventors:

Haruhiko Tan, Kobe, JP;

Hajime Nakahara, San Jose, CA (US);

Shota Tominaga, Santa Clara, CA (US);

Hiroyuki Yoshida, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/68 (2006.01); H01L 21/687 (2006.01); B65G 47/90 (2006.01);
U.S. Cl.
CPC ...
H01L 21/681 (2013.01); B65G 47/905 (2013.01); H01L 21/68707 (2013.01); B65G 2203/0233 (2013.01); B65G 2203/044 (2013.01);
Abstract

An aligner apparatus according to one or more embodiments may include a first rotating base, a second rotating base, and a detection apparatus. The first rotating base on which a wafer placed thereon rotates around a first rotation axis line. The second rotating base on which a wafer placed thereon rotates around a second rotation axis whose position is different from that of the first rotation axis line. The detection apparatus includes one sensor for detecting the edge of the wafer, and the detection range of the sensor includes the edge of the wafer placed on the first rotating base and the edge of the wafer placed on the second rotating base, and detects the edges of the two wafers.


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