The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2022
Filed:
Dec. 19, 2018
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Se Woong Lee, Daejeon, KR;
Seong Yong Ahn, Daejeon, KR;
Kun Ji Kim, Daejeon, KR;
Hyun Kyou Ha, Daejeon, KR;
Assignee:
LG Chem, Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 14/06 (2006.01); C08L 27/06 (2006.01); C08L 29/04 (2006.01);
U.S. Cl.
CPC ...
C08F 14/06 (2013.01); C08L 27/06 (2013.01); C08L 29/04 (2013.01); C08L 2205/025 (2013.01); C08L 2205/035 (2013.01);
Abstract
The present invention relates to a method for preparing a vinyl chloride-based polymer, more specifically, to a method for preparing a vinyl chloride-based polymer through which it is possible to improve an apparent specific gravity of a vinyl chloride-based polymer to be prepared by controlling a surface tension of a polymerization mixture to 46.5 mN/m or more, and thus, to improve an extrusion amount when extruded, whereby a vinyl chloride-based polymer having excellent processing productivity can be prepared.