The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2022
Filed:
Mar. 30, 2021
Coretronic Corporation, Hsin-Chu, TW;
Coretronic Corporation, Hsin-Chu, TW;
Abstract
A method for generating a mask and a projection apparatus for performing the method are provided. The method includes: projecting a first pattern onto a projection surface, wherein the projection surface includes a non-planar region, and the first pattern includes multiple first straight lines; shooting a first image of the projection surface on which the first pattern is rendered; finding at least one first specific line segment in the first image, wherein each first specific line segment includes at least one first inflection point; delineating a first contour based on the at least one first inflection point in a case of determining that the at least one first inflection point in the first image is suitable for delineating the first contour; and generating a first mask pattern based on the first contour in a case of determining that the first contour matches a region contour of the non-planar region.