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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11322561 B1

PDFFull Text
Date of Patent:
May. 03, 2022

Filed:

Apr. 25, 2019

Photoresist composition, pixel definition layer, display substrate and method for preparing the same, and display device

Applicants:

Hefei Xinsheng Optoelectronics Technology Co., Ltd., Anhui, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Wei Li, Beijing, CN;

Jingjing Xia, Beijing, CN;

Bin Zhou, Beijing, CN;

Jun Cheng, Beijing, CN;

Yingbin Hu, Beijing, CN;

Wei Song, Beijing, CN;

Guangyao Li, Beijing, CN;

Biao Luo, Beijing, CN;

Assignees:

HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD., Anhui, CN;

BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;

Attorney:

Brooks Kushman P.C.

Primary Examiner:

Sheikh Maruf

Int. Cl.
CPC ...
H01L 27/32 (2006.01); H01L 51/00 (2006.01); G03F 7/031 (2006.01); G03F 7/033 (2006.01); G03F 7/16 (2006.01); H01L 51/56 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
H01L 27/3246 (2013.01); G03F 7/031 (2013.01); G03F 7/033 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); H01L 27/3283 (2013.01); H01L 51/004 (2013.01); H01L 51/0005 (2013.01); H01L 51/0018 (2013.01); H01L 51/0021 (2013.01); H01L 51/0026 (2013.01); H01L 51/56 (2013.01); H01L 51/5221 (2013.01); H01L 2251/556 (2013.01);
Abstract

The present disclosure provides a photoresist composition, a pixel definition layer, a display substrate and a method for preparing the same, and a display device. The photoresist composition includes: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; 0.5 to 2 wt % of a photoinitiator; and 0.1 to 1 wt % of a monomer.

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