The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2022

Filed:

Feb. 28, 2014
Applicant:

Sony Corporation, Tokyo, JP;

Inventor:

Shinya Yamakawa, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01); H04N 5/374 (2011.01); H04N 5/361 (2011.01);
U.S. Cl.
CPC ...
H01L 27/14612 (2013.01); H01L 27/1464 (2013.01); H01L 27/14603 (2013.01); H01L 27/14614 (2013.01); H01L 27/14638 (2013.01); H01L 27/14641 (2013.01); H01L 27/14643 (2013.01); H01L 27/14647 (2013.01); H01L 27/14689 (2013.01); H04N 5/361 (2013.01); H04N 5/374 (2013.01); H01L 27/14621 (2013.01); H01L 27/14627 (2013.01);
Abstract

There is provided a solid state image sensor including a photoelectric conversion unit formed and embedded in a semiconductor substrate, an impurity region that retains an electric charge generated by the photoelectric conversion unit, and a transfer transistor that transfers the electric charge to the impurity region. A gate electrode of the transfer transistor is formed in a depth direction toward the photoelectric conversion unit in the semiconductor substrate, from a surface of the semiconductor substrate on which the impurity region is formed. A channel portion of the transfer transistor is surrounded by the gate electrode in two or more directions other than a direction of the impurity region, as seen from the depth direction.


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