The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2022
Filed:
Jan. 16, 2020
Applicant:
Tcl China Star Optoelectronics Technology Co., Ltd., Shenzhen, CN;
Inventors:
Shuting Zhong, Shenzhen, CN;
Ning Zhang, Shenzhen, CN;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G03F 1/00 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1288 (2013.01); G03F 1/00 (2013.01); G03F 7/2022 (2013.01); H01L 27/1214 (2013.01);
Abstract
The present disclosure provides a manufacturing method of a TFT pattern, and a mask, which is used to make light pass through a hole corresponding to a position of the TFTs on the mask which is disposed on the TFTs, thereby producing two or more stacked photoresists on the TFTs to counteract a reflected light on a semiconductor As layer and ensure normal working of the TFTs.