The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2022
Filed:
Mar. 13, 2019
Sinfonia Technology Co., Ltd., Tokyo, JP;
Toshihiro Kawai, Tokyo, JP;
Gengoro Ogura, Tokyo, JP;
Sinfonia Technology Co., Ltd., Tokyo, JP;
Abstract
In an inert-gas circulating type EFEM, generation of any constraints on installation of incidental equipment, a maintenance door, or the like is inhibited, and the need for changing the placement position, etc. of a feedback path according to the specifications, etc. of a substrate processing device connected thereto is eliminated. An EFEMis provided with: a transfer chamberin which a wafer W is conveyed; a unit installation chamberin which a FFUfor feeding nitrogen to the transfer chamberis installed; and a return pathfor feeding the nitrogen having flown through the transfer chamber, back to the unit installation chamber. A substrate processing apparatusis connected to the rear-side end of the transfer chamber. The return pathis disposed at the front-side end of the transfer chamber