The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2022

Filed:

Jul. 27, 2020
Applicant:

Nec Laboratories America, Inc., Princeton, NJ (US);

Inventors:

Pan Ji, San Jose, CA (US);

Quoc-Huy Tran, Santa Clara, CA (US);

Manmohan Chandraker, Santa Clara, CA (US);

Yuliang Zou, Blacksburg, VA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 7/246 (2017.01); G06T 7/579 (2017.01);
U.S. Cl.
CPC ...
G06T 7/251 (2017.01); G06T 7/579 (2017.01); G06T 2207/10016 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30252 (2013.01);
Abstract

A computer-implemented method for implementing a self-supervised visual odometry framework using long-term modeling includes, within a pose network of the self-supervised visual odometry framework including a plurality of pose encoders, a convolution long short-term memory (ConvLSTM) module having a first-layer ConvLSTM and a second-layer ConvLSTM, and a pose prediction layer, performing a first stage of training over a first image sequence using photometric loss, depth smoothness loss and pose cycle consistency loss, and performing a second stage of training to finetune the second-layer ConvLSTM over a second image sequence longer than the first image sequence.


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