The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2022

Filed:

Feb. 27, 2020
Applicants:

Chengdu Boe Optoelectronics Technology Co., Ltd., Sichuan, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Chang Luo, Beijing, CN;

Xiaoyu Yang, Beijing, CN;

Fengli Ji, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); C23C 14/04 (2006.01); C23C 14/24 (2006.01); B23K 26/60 (2014.01); G03F 7/20 (2006.01); H01L 51/00 (2006.01); H01L 21/68 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); B23K 26/60 (2015.10); C23C 14/24 (2013.01); G03F 7/2063 (2013.01); H01L 21/027 (2013.01); H01L 21/682 (2013.01); H01L 23/544 (2013.01); H01L 51/0014 (2013.01);
Abstract

An embodiment of the present application provides a preparation method of a mask assembly, including: fixing, after stretching and aligning a blocking, the blocking on a side of a frame; opening at least one stretching align hole and at least one evaporation align mark in the fixed blocking and frame; fixing, after stretching and aligning a mask sheet, the mask sheet on a side of the blocking away from the frame according to the stretching align hole; and opening at least one evaporation align mark in the fixed mask sheet to obtain the mask assembly.


Find Patent Forward Citations

Luo, Chang. (2022). Preparation method of mask assembly and mask assembly (U.S. Patent No. 11319625). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11319625

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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