The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2022

Filed:

Mar. 09, 2020
Applicants:

Goo Chemical Co., Ltd., Kyoto, JP;

Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;

Inventors:

Teru Sakakibara, Kyoto, JP;

Shinya Komabiki, Kyoto, JP;

Koji Maeda, Kyoto, JP;

Hidehiko Karasaki, Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/78 (2006.01); C09D 167/02 (2006.01); C08G 63/183 (2006.01); C08G 63/189 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
C09D 167/02 (2013.01); C08G 63/183 (2013.01); C08G 63/189 (2013.01); H01L 21/6835 (2013.01); H01L 21/78 (2013.01); H01L 2221/6834 (2013.01); H01L 2221/68327 (2013.01); H01L 2221/68381 (2013.01);
Abstract

A protective composition contains a water-soluble polyester resin including a polyvalent carboxylic acid residue and a polyvalent alcohol residue. The polyvalent carboxylic acid residue includes: a polyvalent carboxylic acid residue having a metal sulfonate group; and a naphthalene dicarboxylic acid residue. The proportion of the polyvalent carboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 25 mol % to 70 mol %. The proportion of the naphthalene dicarboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 30 mol % to 75 mol %.


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