The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2022

Filed:

Dec. 31, 2019
Applicant:

Industrial Technology Research Institute, Hsinchu, TW;

Inventors:

Meei-Yu Hsu, Hsinchu, TW;

Yi-Chun Chen, Hsinchu, TW;

Kai-Chi Chen, Tsautuen Jen, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 220/18 (2006.01); C08F 220/44 (2006.01); C08F 214/22 (2006.01); C08F 220/38 (2006.01); C08L 53/00 (2006.01); C08K 5/375 (2006.01); C08K 5/3415 (2006.01); C08K 5/14 (2006.01);
U.S. Cl.
CPC ...
C08L 53/00 (2013.01); C08F 214/22 (2013.01); C08F 220/1803 (2020.02); C08F 220/387 (2020.02); C08F 220/44 (2013.01); C08K 5/14 (2013.01); C08K 5/3415 (2013.01); C08K 5/375 (2013.01); C08F 2810/40 (2013.01); C08L 2203/16 (2013.01);
Abstract

A block copolymer is provided. The block copolymer includes a first block including repeat units represented by formula (I), and a second block connected to the first block and including repeat units represented by formula (II) or (III). The disclosure also provides a method for preparing the block copolymer and a thin film structure including the same.


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