The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2022

Filed:

Jun. 30, 2020
Applicant:

Xerox Corporation, Norwalk, CT (US);

Inventors:

Mark J. Hirsch, Fairport, NY (US);

David C. Craig, Pittsford, NY (US);

Mark C. Petropoulos, Ontario, NY (US);

Eliud Robles Flores, Webster, NY (US);

Assignee:

Xerox Corporation, Norwalk, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41F 33/00 (2006.01); B41F 7/02 (2006.01); B41M 1/06 (2006.01);
U.S. Cl.
CPC ...
B41F 33/0036 (2013.01); B41F 7/02 (2013.01); B41M 1/06 (2013.01); B41P 2227/70 (2013.01);
Abstract

According to aspects of the embodiments, there is provided a method of determining the amount of fountain solution employed in a digital offset lithography printing system. Fountain solution thickness is determined from diagnostic images that are printed and analyzed using the existing Image Based Controls (IBC). An analysis of the density of solids, halftones, and background as a function of the fountain solution control parameter is performed to decide on the appropriate level of fountain solution. A latitude window of control parameters is then derived for which the digital offset lithography printing system in operation minimizes the undesirable effects of too much or too little fountain solution.


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