The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2022
Filed:
Aug. 13, 2019
Applicant:
Genmont Biotech Incorporation, Tainan, TW;
Inventors:
Yi-Hsing Chen, Tainan, TW;
Wan-Hua Tsai, Kaohsiung, TW;
Wen-Wei Chang, Taichung, TW;
Chia-Hsuan Chou, Tainan, TW;
Assignee:
GenMont Biotech Incorporation, Tainan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61P 17/02 (2006.01); A61K 35/747 (2015.01); A61K 9/00 (2006.01); A61L 15/36 (2006.01);
U.S. Cl.
CPC ...
A61K 35/747 (2013.01); A61K 9/0014 (2013.01); A61L 15/36 (2013.01); A61P 17/02 (2018.01);
Abstract
The present invention relates to a topical composition of facilitating wound healing and reducing scars, which includes an inactivated culture ofspecies as an effective ingredient and can significantly facilitate wound healing as well as reducing scars, thereby can be applied to a method of facilitating wound healing and reducing scars.
Chen, Yi-Hsing. (2022). Topical composition, pharmaceutical composition containing inactivated culture and method of facilitating wound healing and scar reduction using the same (U.S. Patent No. 11318176). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11318176
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile