The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2022
Filed:
Nov. 25, 2016
Applicant:
Persyst Development Corporation, San Diego, CA (US);
Inventors:
Nicolas Nierenberg, La Jolla, CA (US);
Scott B. Wilson, Del Mar, CA (US);
Mark L. Scheuer, Wexford, PA (US);
Assignee:
Persyst Development Corporation, Solana Beach, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61B 5/00 (2006.01); A61B 5/0205 (2006.01); A61B 5/291 (2021.01); A61B 5/316 (2021.01); A61B 5/369 (2021.01); A61B 5/374 (2021.01); A61B 5/11 (2006.01);
U.S. Cl.
CPC ...
A61B 5/7214 (2013.01); A61B 5/0205 (2013.01); A61B 5/1103 (2013.01); A61B 5/291 (2021.01); A61B 5/316 (2021.01); A61B 5/369 (2021.01); A61B 5/374 (2021.01); A61B 5/4552 (2013.01); A61B 5/7203 (2013.01);
Abstract
A method and system for detecting and removing EEG artifacts is disclosed herein. Each source of a plurality of sources for an EEG signal is separated for a selected artifact type. Each source of the plurality of sources is reconstituted into a recorded montage and an optimal reference montage for recognizing the selected artifact type of each source. The sources with artifacts are removed and the remaining sources are reconstituted into a filtered montage for the EEG signal.