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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11316462 B1

PDFFull Text
Date of Patent:
Apr. 26, 2022

Filed:

Jul. 01, 2019

Hydride generation system

Applicant:

Elemental Scientific, Inc., Omaha, NE (US);

Inventors:

Daniel R. Wiederin, Omaha, NE (US);

Austin Schultz, Omaha, NE (US);

Assignee:

Elemental Scientific, Inc., Omaha, NE (US);

Attorneys:

Kevin E. West

Advent, LLP

Primary Examiner:

Monzer R Chorbaji

Int. Cl.
CPC ...
B01L 3/02 (2006.01); H02P 25/18 (2006.01); C01B 6/06 (2006.01); C01B 6/00 (2006.01); H02K 16/04 (2006.01); B63H 21/20 (2006.01); B63H 23/10 (2006.01); G01N 21/73 (2006.01); C01B 6/10 (2006.01); B63H 21/14 (2006.01); H02P 31/00 (2006.01); H02K 3/28 (2006.01); H02K 7/18 (2006.01); H02K 19/16 (2006.01); H02K 21/02 (2006.01); G01N 21/71 (2006.01);
U.S. Cl.
CPC ...
H02P 25/188 (2013.01); B63H 21/14 (2013.01); B63H 21/20 (2013.01); B63H 23/10 (2013.01); C01B 6/00 (2013.01); C01B 6/06 (2013.01); C01B 6/10 (2013.01); G01N 21/714 (2013.01); G01N 21/73 (2013.01); H02K 3/28 (2013.01); H02K 7/183 (2013.01); H02K 16/04 (2013.01); H02K 19/16 (2013.01); H02K 21/024 (2013.01); H02P 31/00 (2013.01); B63H 2021/202 (2013.01); B63H 2021/205 (2013.01); Y02T 70/5236 (2013.01); Y10S 903/906 (2013.01);
Abstract

The present disclosure is directed to a system and a method for hydride generation. In some embodiments, the system includes an assembly for introducing hydride generation reagents into a mixing path or mixing container, where the assembly includes first chamber configured to contain a first hydride generation reagent and a second chamber configured to contain a second hydride generation reagent. A first plunger is configured to translate within the first chamber and cause a displacement of the first hydride generation reagent, and a second plunger is configured to translate within the second chamber and cause a displacement of the second hydride generation reagent. The assembly further includes base coupling the first plunger and the second plunger together.

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