The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 2022

Filed:

Nov. 06, 2017
Applicant:

Morimura Sofc Technology Co., Ltd., Komaki, JP;

Inventors:

Yuki Ota, Nagoya, JP;

Takafumi Shichida, Nagoya, JP;

Kenta Manabe, Nagoya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 8/0265 (2016.01); H01M 8/2483 (2016.01); H01M 8/12 (2016.01);
U.S. Cl.
CPC ...
H01M 8/0265 (2013.01); H01M 8/12 (2013.01); H01M 8/2483 (2016.02);
Abstract

To prevent a reduction in the performance of a unit cell due to a gas shortage in a cathode chamber. An electrochemical reaction unit includes a unit cell, a cathode-side member, and an anode-side member. The electrochemical reaction unit satisfies the following condition on at least one of supply and discharge sides of the cathode chamber. Condition: the distance between the midpoint between opposite end points of a cathode-side opening group including an opening of a cathode-side communication channel and the midpoint (specific point) between opposite end points of an anode-side supply opening group including an opening of an anode-side supply communication channel in a direction parallel to an inner circumferential surface of a cathode chamber hole is shorter than the distance between the centroid of a cathode-side gas channel hole and the specific point in the direction parallel to the inner circumferential surface of the cathode chamber hole.


Find Patent Forward Citations

Loading…