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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11315882 B1

PDFFull Text
Date of Patent:
Apr. 26, 2022

Filed:

Sep. 07, 2018

Alignment mark, substrate and manufacturing method therefor, and exposure alignment method

Applicants:

Ordos Yuansheng Optoelectronics Co., Ltd., Inner Mongolia, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Qinglin Ma, Beijing, CN;

Baojie Zhao, Beijing, CN;

Conghui Zhou, Beijing, CN;

Li Wang, Beijing, CN;

Jian Li, Beijing, CN;

Yan Zhao, Beijing, CN;

Xiang Hui, Beijing, CN;

Xiongwei Wang, Beijing, CN;

Chunhong Ma, Beijing, CN;

Assignees:

ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., Inner Mongolia, CN;

BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;

Attorney:

McDermott Will & Emery LLP

Primary Examiner:

Scott B Geyer

Int. Cl.
CPC ...
H01L 23/544 (2006.01); G03F 1/40 (2012.01); G03F 1/42 (2012.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
H01L 23/544 (2013.01); G03F 1/40 (2013.01); G03F 1/42 (2013.01); G03F 9/7088 (2013.01); H01L 2223/5442 (2013.01); H01L 2223/54426 (2013.01); H01L 2223/54493 (2013.01);
Abstract

An alignment mark includes an alignment region, a peripheral region and a shielding region. The alignment region has an outer contour; the peripheral region is disposed around at least a part of the outer contour of the alignment region; the shielding region is disposed around at least a part of the outer contour of the alignment region and is non-overlapped with the peripheral region; and the alignment region and the shielding region are opaque, and the peripheral region is at least partially transparent.

Find Patent Forward Citations

Ma, Qinglin. (2022). Alignment mark, substrate and manufacturing method therefor, and exposure alignment method (U.S. Patent No. 11315882). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11315882

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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