The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2022
Filed:
Apr. 12, 2021
Daikin Industries, Ltd., Osaka, JP;
Takehiro Chaki, Osaka, JP;
Tsubasa Nakaue, Osaka, JP;
Megumi Kushida, Osaka, JP;
Kazuhiro Takahashi, Osaka, JP;
DAIKIN INDUSTRIES, LTD., Osaka, JP;
Abstract
The present disclosure provides a method for producing HFC-143 that is not expensive, and that is more efficient than conventional methods. Specifically, the present disclosure provides a method for producing 1,1,2-trifluoroethane (HFC-143) that includes contacting at least one chlorine-containing compound selected from the group consisting of 1,1,2-trichloroethane (HCC-140), 1,2-dichloro-1-fluoroethane (HCFC-141), 1,1-dichloro-2-fluoroethane (HCFC-141a), (E,Z)-1,2-dichloroethylene (HCO-1130 (E,Z)), and (E,Z)-1-chloro-2-fluoroethylene (HCFO-1131 (E,Z)) with hydrogen fluoride to perform one or more fluorination reactions, thereby obtaining a reaction gas containing HFC-143, hydrogen chloride, and hydrogen fluoride.