The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2022
Filed:
Dec. 12, 2011
Applicants:
Ram Gupta, Stamford, CT (US);
Sari-beth Samuels, Ramsey, NJ (US);
Thomas Steele, Milford, CT (US);
J. Mon Hei Eng, Wilton, CT (US);
Inventors:
Ram Gupta, Stamford, CT (US);
Sari-Beth Samuels, Ramsey, NJ (US);
Thomas Steele, Milford, CT (US);
J. Mon Hei Eng, Wilton, CT (US);
Assignee:
CYTEC TECHNOLOGY CORP., Princeton, NJ (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08K 5/00 (2006.01); B29C 41/04 (2006.01); C07D 311/72 (2006.01); C08K 5/34 (2006.01); C08K 5/1545 (2006.01); C08L 23/08 (2006.01); C08K 5/51 (2006.01); B29K 23/00 (2006.01);
U.S. Cl.
CPC ...
B29C 41/04 (2013.01); C07D 311/72 (2013.01); C08K 5/00 (2013.01); C08K 5/005 (2013.01); C08K 5/1545 (2013.01); C08K 5/34 (2013.01); C08K 5/51 (2013.01); C08L 23/0815 (2013.01); B29K 2023/0625 (2013.01); Y02P 20/10 (2015.11);
Abstract
The cycle time of polymer compositions subjected to a rotomolding process is improved (i.e., reduced), while the processing window is simultaneously enlarged through the use of a polymer-stabilizing amount of a processing stabilizer system having at least one chroman-based compound according to Formula V: