The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2022

Filed:

Oct. 14, 2019
Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Wei He, Beijing, CN;

Xiang Li, Beijing, CN;

Huili Wu, Beijing, CN;

Shipei Li, Beijing, CN;

Fang He, Beijing, CN;

Renquan Gu, Beijing, CN;

Sheng Xu, Beijing, CN;

Dongsheng Yin, Beijing, CN;

Xuefei Zhao, Beijing, CN;

Lizhen Zhang, Beijing, CN;

Wusheng Li, Beijing, CN;

Qi Yao, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/06 (2010.01); H01L 27/15 (2006.01); H01L 33/50 (2010.01); B82Y 20/00 (2011.01);
U.S. Cl.
CPC ...
H01L 33/06 (2013.01); H01L 27/156 (2013.01); H01L 33/502 (2013.01); B82Y 20/00 (2013.01); H01L 2933/0041 (2013.01);
Abstract

A patterning method of a quantum dot layer, a quantum dot layer pattern, a quantum dot device, a manufacturing method of the quantum dot device, and a display apparatus are provided. The patterning method of the quantum dot layer includes: forming a quantum dot layer, in which the quantum dot layer includes quantum dots and a photoinitiator; irradiating a preset portion of the quantum dot layer by light having a preset wavelength to quench the quantum dots in the preset portion and form a patterned quantum dot layer.


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