The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2022

Filed:

Nov. 09, 2020
Applicant:

Daihen Corporation, Osaka, JP;

Inventors:

Michio Taniguchi, Osaka, JP;

Kuniaki Miyoshi, Osaka, JP;

Katsushi Michishita, Osaka, JP;

Assignee:

DAIHEN Corporation, Osaka, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32183 (2013.01);
Abstract

Techniques for suppressing an increase in reflected wave power (reflection coefficient) due to IMD are proposed. A high-frequency power supply system for providing a high-frequency power to a connected load includes: a bias power supply which outputs a bias power at a first frequency; a source power supply which outputs a source power at a second frequency higher than the first frequency; and a matching unit including an impedance matching circuit which acquires the bias power and the source power and matches an impedance of the source power supply side with an impedance of the load side. The source power supply determines a delay setting value indicating the timing of starting a frequency variation process with respect to the source power, performs the frequency variation process using the delay setting value and the value of the first frequency, and outputs a frequency-varied source power to the matching unit.


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