The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2022
Filed:
Aug. 18, 2020
Applicant:
Clo Virtual Fashion Inc., Seoul, KR;
Inventor:
Seungwoo Oh, Seoul, KR;
Assignee:
CLO VIRTUAL FASHION INC., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/00 (2011.01); G06T 19/20 (2011.01); G06T 17/20 (2006.01); G06Q 30/06 (2012.01); G06K 9/00 (2022.01);
U.S. Cl.
CPC ...
G06T 19/20 (2013.01); G06K 9/00369 (2013.01); G06Q 30/0643 (2013.01); G06T 17/20 (2013.01); G06T 2219/2021 (2013.01); G06T 2219/2024 (2013.01);
Abstract
Provided is an automatic grading method including calculating a first strain ratio between a three-dimensional (3D) source avatar and a 3D target avatar, determining a mapping relationship between 3D source garment draped over the source avatar and a body portion of the source avatar, converting the source garment into 3D target garment draped over the target avatar, based on the first strain ratio and the mapping relationship, and outputting a two-dimensional (2D) target pattern constituting the target garment.