The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2022

Filed:

Dec. 09, 2020
Applicant:

Hannstar Display Corporation, Taipei, TW;

Inventors:

Mei-Ling Chou, Tainan, TW;

Chih-Wei Chen, Tainan, TW;

Chia-Yu Liu, Tainan, TW;

Ming-Liang Chen, Tainan, TW;

Yao-Chih Chuang, Tainan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/044 (2006.01); H05K 3/00 (2006.01);
U.S. Cl.
CPC ...
G06F 3/0446 (2019.05); H05K 3/0073 (2013.01); G06F 2203/04112 (2013.01); H05K 2201/09681 (2013.01);
Abstract

A mask including a substrate and a mesh pattern are disclosed along with an electronic device. The mesh pattern, being disposed on the substrate, includes a first striped pattern and a second striped pattern; the first striped pattern includes a first, second, and third section, and the second section is disposed between the first and the third sections; the second striped pattern includes a fourth, fifth, and sixth section, and the fifth section is disposed between the fourth and the sixth sections; the first section has a first extension direction, the fourth section has a second extension direction, and a first included angle is between the first extension direction and the second extension direction; the fifth section and the second section intersect each other while having a second included angle between the two sections, and the second included angle is greater than the first included angle.


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