The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2022

Filed:

Sep. 19, 2016
Applicant:

Halliburton Energy Services, Inc., Houston, TX (US);

Inventors:

Yumei Tang, Katy, TX (US);

Burkay Donderici, Pittsford, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01V 3/28 (2006.01); G06F 30/20 (2020.01); E21B 49/00 (2006.01); G01V 3/38 (2006.01); G06F 111/10 (2020.01);
U.S. Cl.
CPC ...
G01V 3/28 (2013.01); E21B 49/00 (2013.01); G01V 3/38 (2013.01); G06F 30/20 (2020.01); E21B 2200/20 (2020.05); G06F 2111/10 (2020.01);
Abstract

A look-ahead logging method includes obtaining an initial resistivity log. The method further includes deriving an initial formation model based on the initial resistivity log. The method further includes estimating deep resistivity measurements from the initial formation model and deriving a reduced-complexity formation model from the estimated deep resistivity measurements. The method further includes collecting actual resistivity measurements and inverting the actual resistivity measurements, using the reduced-complexity formation model, to obtain look-ahead or look-around parameter values. The method further includes displaying the look-ahead or look-around parameter values or storing the look-ahead or look-around parameter values on a non-transient information storage medium.


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