The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2022

Filed:

Aug. 10, 2021
Applicant:

Aeva, Inc., Mountain View, CA (US);

Inventors:

Krishna Toshniwal, Mountain View, CA (US);

Bruno Hexsel, Mountain View, CA (US);

Kumar Bhargav Viswanatha, Santa Clara, CA (US);

Jose Krause Perin, Mountain View, CA (US);

Assignee:

Aeva, Inc., Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01C 3/08 (2006.01); G01S 7/493 (2006.01); G01S 17/32 (2020.01); G01S 17/58 (2006.01); G01S 7/4912 (2020.01);
U.S. Cl.
CPC ...
G01S 7/493 (2013.01); G01S 7/4912 (2013.01); G01S 17/32 (2013.01); G01S 17/58 (2013.01);
Abstract

A set of POIs of a point cloud are received at a first filter, where each POI of the set of POIs comprises one or more points. Each POI of the set of POIs is filtered. At a second filter, a first set of neighborhood points of a POI is selected. A first metric for the first set of neighborhood points is computed. Based on the first metric, a first score of the POI is determined. At a third filter, a second set of neighborhood points of a POI is selected. A second metric for the second set of neighborhood points is computed. Based on the second metric, a second score of the POI is determined. At the first filter, based on the first score and the second score, whether to accept the POI, modify the POI, or reject the POI, is determined to extract range or velocity information.


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