The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2022
Filed:
May. 08, 2017
Schlumberger Technology Corporation, Sugar Land, TX (US);
Michael Thiel, Cambridge, MA (US);
Dzevat Omeragic, Lexington, MA (US);
Andrei Davydychev, Sugar Land, TX (US);
Tarek M. Habashy, Burlington, MA (US);
SCHLUMBERGER TECHNOLOGY CORPORATION, Sugar Land, TX (US);
Abstract
Inversion-based workflows are provided for real-time interpretation of the electromagnetic (EM) look-around and look-ahead measurements. The profile of a look-around zone is determined by interpreting EM measurements of a look-around zone. The profile of the look-around zone characterizes formation dip as well as vertical resistivity or resistivity anisotropy of one or more formation layers of the look-around zone. The profile of a look-ahead zone is determined by interpreting EM measurements of the look-ahead zone. The profile of the look-ahead zone characterizes formation dip as well as horizontal resistivity, vertical resistivity or anisotropy of one or more formation layers of the look-ahead zone. The workflows can also involve interpretation of look-around resistivity measurements to aid in the characterization of the look-around zone.