The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2022
Filed:
Aug. 29, 2018
Applicant:
H.c. Starck Inc., Newton, MA (US);
Inventors:
Shuwei Sun, Framingham, MA (US);
Gary Alan Rozak, Akron, OH (US);
Qi Zhang, Wellesley, MA (US);
Barbara Cox, Norwood, MA (US);
Yen-Te Lee, Taipei, TW;
Assignee:
H.C. STARCK INC., Newton, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/22 (2006.01); C23C 14/08 (2006.01); C23C 14/14 (2006.01); C23C 14/16 (2006.01); C23C 14/34 (2006.01); C23C 14/58 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/22 (2013.01); C23C 14/083 (2013.01); C23C 14/14 (2013.01); C23C 14/165 (2013.01); C23C 14/3407 (2013.01); C23C 14/3414 (2013.01); C23C 14/5873 (2013.01); H01J 37/3429 (2013.01); G06F 2203/04103 (2013.01);
Abstract
Sputtering targets including molybdenum, niobium and tantalum are found to be useful for sputtering films for electronic devices. Sputtering targets with about 88 to 97 weight percent molybdenum show improved performance, particularly with respect to etching, such as when simultaneously etching an alloy layer including the Mo, Nb, and Ta, and a metal layer (e.g., an aluminum layer). The targets are particularly useful in manufacturing touch screen devices.