The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2022

Filed:

Jun. 19, 2020
Applicant:

Sun Chemical Corporation, Parsippany, NJ (US);

Inventors:

Michael J. Jurek, Oak Ridge, NJ (US);

John G. Tiessen, Elk Grove Village, IL (US);

Soichiro Omizu, Aomori, JP;

Juanita M. Parris, Montvale, NJ (US);

Assignee:

Sun Chemical Corporation, Parsippany, NJ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09D 7/20 (2018.01); C09D 11/101 (2014.01); C09D 11/108 (2014.01); C09D 125/06 (2006.01); C09D 4/06 (2006.01); C09D 11/033 (2014.01);
U.S. Cl.
CPC ...
C09D 11/101 (2013.01); C09D 4/06 (2013.01); C09D 7/20 (2018.01); C09D 11/033 (2013.01); C09D 11/108 (2013.01); C09D 125/06 (2013.01);
Abstract

Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.


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