The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2022

Filed:

Dec. 10, 2018
Applicant:

Facebook Technologies, Llc, Menlo Park, CA (US);

Inventors:

Austin Lane, Bellevue, WA (US);

Jack Lindsay, Seattle, WA (US);

Katherine Marie Smyth, Seattle, WA (US);

Thomas John Farrell Wallin, Redmond, WA (US);

Andrew John Ouderkirk, Redmond, WA (US);

Tanya Malhotra, Redmond, WA (US);

Christopher Yuan Ting Liao, Seattle, WA (US);

Yigit Mengue, Kirkland, WA (US);

Assignee:

Facebook Technologies, LLC, Menlo Park, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 9/26 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 1/26 (2012.01); B05D 5/12 (2006.01); B05D 3/12 (2006.01); G02B 27/01 (2006.01); G02F 1/01 (2006.01);
U.S. Cl.
CPC ...
C08J 9/26 (2013.01); B05D 3/12 (2013.01); B05D 5/12 (2013.01); G03F 1/26 (2013.01); G03F 7/16 (2013.01); G03F 7/2002 (2013.01); C08J 2300/12 (2013.01); G02B 27/0172 (2013.01); G02F 1/0128 (2013.01);
Abstract

A method of forming a nanovoided composite polymer includes forming a resin-containing layer over a substrate, the resin-containing layer including a polymer-forming phase and a sacrificial phase, curing the polymer-forming phase to form a polymer matrix containing the sacrificial phase, and removing the sacrificial phase selectively with respect to the polymer matrix to form a nanovoided composite polymer including the polymer matrix and nanovoids dispersed throughout the polymer matrix. The nanovoids may be randomly or regularly dispersed throughout the matrix. Various other methods, systems, apparatuses, and materials are also disclosed.


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