The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2022
Filed:
Oct. 12, 2020
Ihi Corporation, Tokyo, JP;
Shiko Nakamura, Tokyo, JP;
Yoshiyuki Iso, Tokyo, JP;
Kenji Takano, Tokyo, JP;
Shinya Okuno, Tokyo, JP;
Ryosuke Ikeda, Tokyo, JP;
Hirohito Okuhara, Tokyo, JP;
IHI Corporation, Tokyo, JP;
Abstract
A gas-liquid contact apparatus has a gas-liquid contact unit, a liquid supply system, and a gas supply system. The gas-liquid contact unit includes a plurality of stages which are allocated so as to be arranged in the lateral direction. Each of the plurality of stages includes a plurality of vertical flat plates arranged parallel to each other at intervals. The liquid supply system supplies a liquid to the gas-liquid contact unit, and causes the liquid to be circulated along the arrangement of the plurality of stages successively. The gas supply system supplies a gas to the gas-liquid contact unit, and causes the gas to be circulated along the arrangement of the plurality of stages successively. The supplied liquid flows down on the plurality of vertical flat plates in each of the plurality of stages, and comes into contact with the supplied gas.