The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2022
Filed:
Dec. 31, 2020
Applicant:
Advanced Energy Materials, Llc, Louisville, KY (US);
Inventors:
Juan He, Louisville, KY (US);
Tu Nguyen, Louisville, KY (US);
Mahendra Sunkara, Louisville, KY (US);
Assignee:
Other;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/62 (2006.01); B01J 20/34 (2006.01); B01D 53/14 (2006.01); B01D 53/81 (2006.01); B82Y 30/00 (2011.01); C01B 32/50 (2017.01);
U.S. Cl.
CPC ...
B01D 53/62 (2013.01); B01D 53/1418 (2013.01); B01D 53/1475 (2013.01); B01D 53/81 (2013.01); B01J 20/3433 (2013.01); B01J 20/3441 (2013.01); C01B 32/50 (2017.08); B01D 2253/112 (2013.01); B01D 2257/504 (2013.01); B01D 2258/0283 (2013.01); B82Y 30/00 (2013.01);
Abstract
The present development is a method for capturing and purifying COfrom a flue gas stream using a metal aluminate nanowire absorbent and then regenerating the absorbent. After the COis adsorbed into the absorbent, the adsorbent is regenerated by subjecting the COsaturated adsorbent to a dielectric barrier discharge plasma or to a microwave plasma or to a radio frequency (RF) plasma while ensuring that the external temperature does not exceed 200° C.