The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2022

Filed:

May. 08, 2019
Applicant:

Nuvoton Technology Corporation, Hsinchu, TW;

Inventors:

Chih-Hao Chen, Hsinchu, TW;

Wen-Ying Wen, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/778 (2006.01); H01L 21/3205 (2006.01); H01L 29/20 (2006.01); H01L 29/417 (2006.01); H01L 29/66 (2006.01); H01L 29/49 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7786 (2013.01); H01L 21/32051 (2013.01); H01L 29/2003 (2013.01); H01L 29/41725 (2013.01); H01L 29/4966 (2013.01); H01L 29/66462 (2013.01);
Abstract

A high electron mobility transistor (HEMT) device including a substrate, a first channel layer, a second channel layer, a cap layer, a first metal nitride layer, a gate, a source, and a drain is provided. The first channel layer is disposed on the substrate. The second channel layer is disposed on the first channel layer. The cap layer is disposed on the second channel layer and exposes a portion of the second channel layer. The first metal nitride layer is disposed on the cap layer. The gate is disposed on the first metal nitride layer. The width of the first metal nitride layer is greater than or equal to the width of the gate. The source and the drain are disposed on the second channel layer at two sides of the gate.


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