Active matrix substrate and production method therefor

Abstract

Each of pixel regions of an active matrix substrate () includes: a lower insulating layer (); an oxide semiconductor layer () that is arranged on the lower insulating layer and includes an active region () of an oxide semiconductor TFT; an upper insulating layer () that is arranged on a portion of the oxide semiconductor layer so as not to be in contact with the lower insulating layer; an upper gate layer () that is arranged on the upper insulating layer and includes an upper gate electrode () and one of a plurality of gate bus lines (GL); and a source electrode and a drain electrode, wherein: the oxide semiconductor layerfurther includes an extension region () that extends from the active region () in a direction x different from a channel length direction y of the oxide semiconductor TFT as seen from a normal direction to the substrate; and the extension region () is arranged on the substrate side of one of the plurality of gate bus lines (GL) with an upper insulating layer () interposed therebetween, and includes a portion that extends so as to overlap with the one of the plurality of gate bus lines.