The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2022
Filed:
Mar. 31, 2020
Integrated Silicon Solution, (Cayman) Inc., Grand Cayman, KY;
Amitay Levi, Cupertino, CA (US);
Dafna Beery, Palo Alto, CA (US);
Andrew J. Walker, Mountain View, CA (US);
Integrated Silicon Solution, (Cayman) Inc., Grand Cayman, KY;
Abstract
A structure for providing an inverter circuit employing two vertical transistor structures formed on a semiconductor substrate. The vertical semiconductor structures each include a semiconductor pillar structure and a surrounding gate dielectric. A gate structure is formed to at least partially surround the first and second vertical transistor structures. The semiconductor substrate is formed into first and section regions that are separated by a dielectric isolation structure. The first region includes a P+ doped portion and an N+ doped portion, and the second region includes an N+ doped portion and a P+ doped portion. The N+ and P+ doped portions of the first and second regions can be arranged such that the N+ doped portion of the first region is adjacent to the P+ doped portion of the second region, and the P+ doped portion of the first region is adjacent to the N+ doped portion of the second region.