The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11302118 B1

Date of Patent:

Apr. 12, 2022

Filed:

Sep. 09, 2020

Method and apparatus for generating negative sample of face recognition, and computer device

Applicant:

Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;

Inventors:

Wenhan Luo, Shenzhen, CN;

Linchao Bao, Shenzhen, CN;

Yuan Gao, Shenzhen, CN;

Wei Liu, Shenzhen, CN;

Assignee:

TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED, Shenzhen, CN;

Attorney:

Morgan, Lewis & Bockius LLP

Primary Examiner:

Brian Werner

Int. Cl.

CPC ...

G06K 9/36 (2006.01); G06V 40/40 (2022.01); G06K 9/62 (2022.01); G06V 40/50 (2022.01); G06V 40/16 (2022.01);

U.S. Cl.

CPC ...

G06V 40/40 (2022.01); G06K 9/6256 (2013.01); G06V 40/172 (2022.01); G06V 40/50 (2022.01);

Abstract

This application discloses a method of generating a negative sample for face recognition performed at a computer device. The method includes: obtaining a positive sample of a face from a training sample library required for machine learning of face recognition; embedding the obtained positive sample in a selected negative sample template, to obtain an intermediate sample of the face that simulates displaying of the positive sample in a display region of the negative sample template; and fusing the intermediate sample in a selected scenario sample, to obtain a negative sample of the face required for machine learning of face recognition.

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