The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2022

Filed:

Aug. 21, 2018
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:
Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05B 12/32 (2018.01); B29C 64/153 (2017.01); B29C 64/245 (2017.01); B29C 64/371 (2017.01); B05B 7/08 (2006.01); B05B 12/00 (2018.01); B05B 12/08 (2006.01); B22F 10/20 (2021.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 40/00 (2020.01);
U.S. Cl.
CPC ...
B05B 12/32 (2018.02); B05B 7/08 (2013.01); B05B 12/006 (2013.01); B05B 12/087 (2013.01); B22F 10/20 (2021.01); B29C 64/153 (2017.08); B29C 64/245 (2017.08); B29C 64/371 (2017.08); B22F 2201/11 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 40/00 (2014.12);
Abstract

An additive manufacturing (AM) system includes a housing defining a chamber, a build platform disposed within the chamber, and an upper gas inlet configured to supply an upper gas flow in a first direction parallel to the build platform. The AM system includes a lower gas inlet disposed in the chamber and configured to supply a lower gas flow in a second direction toward a bottom wall of the chamber, and a flow directing system configured to receive the lower gas flow and redirect the lower gas flow in the first direction parallel to the build platform. The AM system includes one or more gas delivery devices fluidly coupled to the upper and lower gas inlets and configured to regulate one or more flow characteristics of the upper and lower gas flows and a gas outlet configured to discharge the upper and lower gas flows from the chamber.


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